3DS' Japanease basic patent becomes invalid

From: T. S. Hagiwara (hagi@mx.ksp.or.jp)
Date: Mon Jul 23 2001 - 18:32:14 EEST

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Dear Terry and rp-ml members,

July 19, 2001, the "Japanese Supreme Court" dismissed the final appeal by
3D systems concerning to the Japanese Patent No. 1979820 (>1 W/cm^2, <1mm
beam diameter, <1mm thick layer, and resin absorption) which is the 3DS'
basic patent of stereolithography in Japan.
The patent becomes absolutely invalid.

******************************************************
T. S. Hagiwara <hagi@mx.ksp.or.jp>
5-29-6, Hino-Honmachi, Hino, Tokyo 191-0011, JAPAN
******************************************************

For more information about the rp-ml, see http://rapid.lpt.fi/rp-ml/

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